The S800 & SoliTrac Series provides automatic
(cassette to cassette) spin processing for wafers/substrates and irregular shaped
substrates of up to 150mm diagonal dimensions. The SoliTrac utilizes a PC microcomputer with flat panel display. Optional SECS communication.
Features
Processes: |
Coat, Develop, Scrub/Jet, Bake, Metal Lift-Off and Etch |
Coat: |
Solitec Pump (Teflon Diaphragm), Pressurized Cartridge Dispense, both with fixed dispense arm
or Solitec's exclusive AUTOCOAT dispense arm (programmable). Most O.E.M. Pump Supported |
Develop: |
Aspirated Atomized Spray, Pressurized Fan Spray, Solitec's exclusive Ultrasonic
OPTIMIST Spray, Harmonic Jet/Metal Lift-off Strippers (stepper motor controlled), plus optional temperature controlled chemical supply |
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Vapor Prime: |
Wafer Pre-coat priming for increased adhesion. Standard temperature configuration to 250 C
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Chill: |
Stabilizes wafer temperature after post exposure and Vapor Prime baking. |
Bake: |
Up to 250°
C. Proximity and Contact Bake.
±0.5°C to 125°C; ± 0.5% 125-250°C
PID Temperature Control in 1°C Increments |
Elevated
TempBake: |
Hot Plate Temperature Uniformity
± 0.5°C at 100°C
± 1.2°C at 300°C
± 2.1% at 350°C
± 2.3% at 400°C
± 2.6% at 430°C |
Cartridge Dispense System SWP, Inc. s Cartridge Dispense System allows the End User to change out
coating materials in minutes. 
Pneumatic operated and stand alone mounting so that it can be used
on virtually any apply system.
New and Used Semiconductor Equipment - Solitec pump 
Available with remote gauge and regulator panel or as all in one packaging.
Picture above has separate gauge / regulator panel.
Sketch to right shows gauges and regulators mounted onto the pump.
Pneumatic Resist Pump by Solitec. Works on virtually any apply system. 
Disclaimer: All specifications, features, services and products are subject to change at anytime.
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